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What's new in LASTIP/PICS3D Version 2006.11 (Oct.29,06)

We are pleased to announce the Nov. 2006 release of LASTIP (laser technology integrated program) and PICS3D (photonic integrated circuit simulator in 3D) with the following release notes.

New or improved physical models

  • Multiple-cavity laser model implemented enabling a new class of application including bipolar cascade laser and laser arrays.

  • More accurate method of modal gain evaluation (based on imaginary propagation constant) available. 

  • External external cavity VCSEL and large signal transient simulation for multiple segment DBR+EAM demonstrated.

  • Multiple shallow dopant types may be used together.

  • QWIP/QCL model improved using non-localized intersubband absorption and with non-local quantum transport effects.

  • Quantum dot (QD) model can describe separate non-radiative lifetimes for QW and QD regions.

Enhanced performance

  • General speed up due to improved program structure.

  • Efficiency of parallel solver increased.

  • Self-consistent MQW model faster with more user control.

  • Speed of eigen value solver improved.

  • Convergence of pics3d may be improved with new analytical optical gain model.

More convenient features

  • Material macro data base system improved so that "if-else-" logical expression can be inserted anywhere within a macro function 
    just like in any high level programming language.

  • Output data file identification and display are more flexibility and convenient.

  • More user-control for Newton solver.

  • Contact statement improved so that it is more convenient when one electrode is in contact with more than one type of semiconductor.

  • Bias may be automatically terminated by current or laser power.

  • Labels and tags more extensively used so that geometry location may be referenced by label name.

  • High frequency AC analysis data export in Touchstone 2-port data format enabled.

  • More flexible ways to define a tunneling junction.

 

Announcing APSYS Version 2006.7 (Jun.29,06)

We are pleased to announce the release of version 2006.7 of APSYS (advanced physical models for semiconductor devices).
Numerical stability and accuracy of the simulation engine of this version have been significantly improved for the treatment of strained valence bands of GaN and related group III nitrides (i.e., HH/LH/CH bands of wurtzite crystal structure). The new version comes with updated material parameters for all group III nitrides so that more reliable results may be obtained without the need for modification of default parameters. The following are more specific improvements and enhancements of the simulation engine.

  • In an effort to upgrade the simulation capability of APSYS for more complex structures containing hundreds or thousands of material layers (such as quantum cascade laser and novel LED structure with super-lattices), the complex-MQW option has been enhanced to handle a new material macro type called super-structure macro which is used to include sub-projects of micro-scale simulation (say several periods within a super-lattice) so that all properties (such as density of states and effective mobility) of the sub-projects are transferred to and combined with the macro-scale device simulation.

  • The multiple layer optical module has been enhanced to include resonant optical cavity calculation so that resonant cavity light emitting diode (RCLED) can be rigorously treated. Based on Green's function method, resonant effects in wavelength, angle of emission and standing wave have been included self-consistently with photon-recycling model. More details may be found in our presentation on RCLED.

  • Photon-recycling model has been included in the fast-analytical LED model so that this efficient technique may be more accurate when the LED power is high. From now on all of our LED models (Fast-analytical, ray-tracing and RCLED) are capable of treating photon-recycling effects.

  • Hot carrier energy dependent impact ionization has been enabled in the hydrodynamic solver so that  spatial effect of the dark space (low energy region without impact ionization) in an avalanche photodiode (APD) can be accurately taken into account. More details may be found in our presentation on APD.

  • The intersubband option has been enhanced and for the first time we have demonstrated the simulation of quantum well infrared photodetector (QWIP) using a quantum corrected drift-diffusion model. More details may be found in the presentation on QWIP.

  • Organic semiconductor data base is much enhanced and the organic light emitting diode (OLED) option may now be combined with the resonant cavity option to provide more realistic modeling of an OLED. Some details are available from this presentation on OLED.

  • Raytracing-3D option has been enhanced so that rounded/curved surfaces may be handled without slowing down the simulation. Also more new emission source models are implemented for LED application.

  • The mesh generator has been upgraded so that triangles generated for complicated 2/3D structures are now more reasonable.

  • Multi-CPU/parallel option has been improved so that more parts of the code are paralleled and the overall parallel efficiency
    is increased. In previous versions parallelization were limited to the linear solver only.

This version also includes substantial improvement in the graphic user interface (GUI).  Here are some specifics: SimuCenter: handling of multiple file execution and improvement in simulation series stepping.  LayerBuilder/GeoEditor: better visual effects and ability
to handle more complex 3D structures such as VCSEL/RCLED.  CrosslightView: better visual effects and 3D vector/flow plots have been included.

Finally we are pleased to introduce a new GUI program series called Crosslight Design Studio which aims at completely hiding any text operations so that all simulation actions are completed via clicking on a set of predefined buttons. The first of this series is the LED Design Studio working with the new APSYS 2006.7.

 

Training Workshop on July 14 at InterOpto'06 (Jun23,06)

Crosslight Software intends to hold a free training workshop on July 14th, at InterOpto'06 (International Optoelectronics Exhibition) located at Makuhari Messe, Japan. Advanced problem solving as well as introductory hands-on training will be covered. Language of the workshop is in both Japanese and English. Admission and software training license are both free but advanced reservation is highly recommended. For more details, please contact Crosslight's Japan office at www.crosslight.jp.


Crosslight Workshop on Sept. 15 at NUSOD06 (Jun13,06)

Crosslight invites everyone to a free training workshop on 15 Sept. 2006 in Nanyang Technology University, Singapore, to be held after the NUSOD06 conference. Dr. Joachim Piprek, an international expert in using Crosslight's device simulators, has been invited to lecture
on how to create realistic device simulations at this hands-on tutorial workshop. All registered participants are eligible to receive a free training license of Crosslight's simulation software. For more details, please visit the conference website


Recent Simulation Software Updates (May30,06)

We wish to update our users on the following recent simulator improvements. In addition to numerous minor modifications, the device simulators (APSYS/PICS3D/LASTIP) version 2005.11/may06-patch improves on both speed and accuracy mainly affecting the thermal option. CSUPREM (2/3D) has fixed a mesh related bug contained in the original code from Stanford University.  Also the lower limit of the ion-implantation energy range has been extended.  The specialized MOCVD simulator PROCOM (2/3D) has been enhanced so that it is more convenient to model incorporation of dopants and impurities. Most significantly, p-doping (Mg) in GaN growth has been demonstrated. This version also includes improvement in treatment of surface site occupancy during MOCVD growth. 


SUPREM(3D) Enhanced for MEMS (Jan6,06)

CSUPREM (Crosslight's version of SUPREM) has been enhanced to include 3D simulation of micro-electro-mechanical systems (MEMS). MEMS simulation is now really easy. All you need is SUPREM.IV.GS from Stanford plus latest innovation from Crosslight. Please see our presentation in our Download session of this website and contact us for a free-trial (ask for version 2006.1).


Announcing Device Simulators Version 2005.11 (Oct.2,05)

Version 2005.11 of Crosslight's device simulators (APSYS/PICS3D/LASTIP) includes numerous new features, updates and improvements. The main new features include physical models for quantum dots and intersubband transitions. These features widens the application scope of our simulators to include quantum dot laser diodes (QDot Lasers), [Read More]


SUPREM Fully Extended to 3D (Sep13,05)

Crosslight is pleased to announce that all capabilities and models of CSUPREM (Crosslight's version of SUPREM) has been extended from 2D to 3D. This should be good news for process engineers familiar with the original SUPREM.IV.GS from Stanford University (or TMA) since all older 2D input files may easily be extended to 3D simulation. For a concise description of CSUPREM, please see the following product brochure.


Self-heating Model Improved(Sep01,05)

We are pleased to inform users of our device simulators(LASITP/APSYS/PICS3D) that the convergence of self-heating model has been improved so that it is easier to obtain thermal roll-off of the optical power for LD or LED. This patched version also includes numerous minor bug fixes for the graphic user interface. It is highly recommended that users of the thermal option contact Crosslight to obtain an upgrade.


Crosslight Workshop on Sept. 23,05. (Jul15,2005)

Dr.Joachim Piprek has been invited to hold a tutorial workshop on Crosslight's device simulators on Sept. 23, 2005 in Humboldt University Berlin, Germany; This workshop is free of charge and aims to teach strategies for obtaining realistic simulation results.

Dr. Piprek is among the most successful users of Crosslight's simulators and his tutorial workshops are highly recommended for simulation beginners and experts alike. Please see the following link for more details.


Announcing Device Simulator Version 2005.3 (Mar11,2005)

We are pleased to announce Crosslight Device Simulator Version 2005.3 (including APSYS, PICS3D and LASTIP).Product upgrade is scheduled to start by the end of March,2005. The major new features and improvements are as follows: [Read More]


Device Simulator Version 2004.8 Patched (Oct14,2004)

This is to announce the availability of a patched version of the 2004.8 release which contains numerous bug fixes and improvements such as the following: [Read More]


Announcing New Product CSUPREM (Sep.15,2004)

Crosslight Software is pleased to announce the release of a new product CSUPREM. CSUPREM (Crosslight-SUPREM) is a powerful and accurate process simulation program for silicon and GaAs. It is based on the process simulation program code of SUPREM.IV.GS developed in Integrated Circuit Laboratory, Stanford University. SUPREM.IV.GS has been recognized as the industry standard in process simulation for the integrated circuit (IC) design for over a decade. [Read More]


Crosslight Workshop 2004 (July23,2004)

Crosslight Software is pleased to offer a workshop on application of Crosslight simulators in semiconductor optoelectronic devices in conjunction with the NUSOD 2004 conference at UCSB. The one-day workshop will be jointly hosted by Dr. Simon Li (Crosslight) and Prof. Joachim Piprek (UCSB). The workshop includes lectures and demonstrations as well as individual tutorial according to requirements of attendees. This will also be a good opportunity to learn the latest features of Crosslight software packages. The cost is 99 USD. To reserve your seat, please contact (suihua@crosslight.com). The program of the Workshop can be found at this [link].


Device Simulation Software Version 2004.8 Released (July11,2004)

We are pleased to announce the release of Crosslight device simulation software (APSYS, LASTIP and PICS3D) version 2004.8 to be shipped in early Aug. 2004. This version contains substantial improvement, numerous bug fixes and several new modules and options. It is highly recommended for those users who wish to add new features as well as those who simply wish to upgrade the their existing modules. The new features are as follows. [Read More]


PROCOM 2004.3 released (Mar 12,2004)

We are pleased to announce the release of PROCOM version 2004.3. The main new features are as follows: [Read More]


Patched Version of Device Simulators Available (Mar1,2004)

This is to announce the availability of a new patched version of device simulator based on our Dec. 2003 release which we shall refer to as version 2003.12.3. Most of the changes are minor bug fixes. If you believe the changes affect your simulation application and you have an updated maintenance contract, please contact Crosslight to receive an updated version. The changes are described as follows. [Read More]